Nano 3D Optical Surface Profilometers SuperView W2

- Model No.: SuperView W2
  Product name: Nano 3D Optical Surface Profilometers
- Standard field of view: 0.98*0.98mm
  
  Repeatability of Roughness RMS: 0.005nm
  
  Scanning range: 10mm
  
  Resolution: 0.1nm
  
  Accuracy of stage measurement: 0.3 %
  
  Repeatability of stage measurement: 0.08% 1σ

details

Dedicated Functions for Semiconductor Field

Measure profile trenches after laser grooving in the dicing process.
Measure film step-height of wafer ranging from 1nm~1mm.
Measure roughness of silicon cut sheet after grinding process, and can measure
dozens of small areas to obtain the average value by one click.
Support 6", 8" wafer measurement

Description

SuperView W2 Optical 3D Surface profilometer is an ideal instrument for sub-Nanometer measurement of various precision parts. Based on the principle of white light interference technology, combined with precision Z-direction scanning module and 3D modeling algorithm, it contactlessly scans the surface of the object then establish a 3D image for the surface. A serial of 2D, 3D parameters reflecting surface quality of the object are obtained after XtremeVision software processes and analyzes the 3D image. The SuperView W3 is a user-friendly precision optical instrument with powerful analysis functions for all kinds of surface form & roughness parameters. With unique light source it could measure various precision parts with both smooth and rough surface.

Parameters

Model No.		SuperView W2	SuperView W2-Ultra
Light Source		White LED
Video System		1024×1024
Objective Lens		Standard: 10X(Optional: 2.5X, 5X, 20X, 50X, 100X)
Optical Zoom		Standard: 0.5X(Optional: 0.375X, 0.75X,1X)
Standard Field of View		0.98×0.98mm	1.1*1.1mm
Lens Turret		Motorized 5 holes turret
XY Object Table	Size	Φ312mm
	Moving Range	200×200mm
	Loading Capacity	20kg
	Control Mode	Motorized
Tilt		±2°(Motorized)
Z Axis Focusing	Travel Range	100mm
	Control Mode	Motorized
Z Stroke Scanning Range		10mm
Surface Topography Repeatability*¹		0.1nm
Roughness RMS Repeatability*²		0.005nm
Step Height Measurementy*³		Accuracy: 0.3%; Repeatability: 0.08%(1σ)
Scanning Speed@0.1nm Resolution		5μm/s	16μm/s
Weight		535kg
Size(LxWxH)mm		800x700x1520
Working Environment	Temperature	0°C~30°C, fuctuation <2°C/60min
	Humidity	5%~75% RH, no condensation
	Vibration	VC-C or better
	Software Noise Evaluation*⁴	3σ≤4nm
	Compressed Air	0.6Mpa oil-free, water-free, 6mm diameter of hose
	Power Supply	AC100~240V, 50/60Hz, 300W
	Other	No strong magnetic field, No corrosive gas
1 Use EPSl mode to measure Sa 0.2nm silicon wafer in the laboratory environment; Single stripe, 80um filter for full field of view 2 Measure Sa 0.2nm silicon wafer in a laboratory environment according to the ISO 25178. 3 Measure standard 5μm steps height block in a laboratory environment according to the ISO 5436-1:2000 5 When the software noise evaluation is 4nm≤3σ≤10nm, the Roughness RMS repeatability is revised down to 0.015nm, the Step height measurement accuracy is revised down to 0.7%, and the step height measurement repeatability is revised down to 0.12%; When the software noise evaluation is 3σ>10nm, the environment does not meet the requirement for usage of the equipment, and need to change the site.

Applications

It is used for measurement and analysis of surface roughness and profile of precision components from industries of semi-conductor, 3C Electronics, ultraprecise machining, optical machining, micro-nano materials, micro-electro-mechanical system.

Measurement and analysis for various products, components and materials`surface form and profile characteristics, such as flatness, roughness, waviness, appearance, surface defect, abrasion,corrosion, gap, hole, stage, curvature, deformation, etc.